Atomic Layer Deposition For tailored bottom-top growth of MAX and MXene films - ALD4MAX

Project summary

ALD4MAX will tackle the deposition of MAX phases and MXenes by Atomic Layer Deposition (ALD). MAX phases are ternary carbides and nitrides with specific stoichiometry and layered structure which show very interesting properties. MXenes are 2D systems equivalent to graphene which result from the elimination of the element ‘A’ from the MAX phase. There is no simple approach to deposit MAX phases on conventional substrates; e.g. heating at high temperatures is needed, which is inviable in many cases. Moreover, MXenes are only prepared in bulk form by chemical etching of the MAX phase, but the deposition of individual MXene is not reported. In ALD4MAX we will take benefit of the layer-by-layer growth characteristic of ALD to deposit MAX phases and MXenes with high control, and also ‘mixed’ MAX phases by stacking different types of MAX phases. ALD4MAX will generate a high impact, since not only a new class of materials will be prepared, but also new possibilities for ALD will be proven.