FunctionaL Inorganic layers for Next Generation Optical devices - FLINGO

Project summary

FLINGO brings together leading representatives from academia, SMEs and industry to explore & develop various surface and coating technologies (Sol-Gel, ALD, spray pyrolysis) for LED applications. Highly transparent conductive layers for electrical contacts, inorganic matrix materials for extending the operating range of optical converters and ultrathin, chemically stable passivation layers for electrical insulation & barrier properties are key technologies enabling future optoelectronic devices. A number of promising new nanomaterials (e.g. QDs, nanorod-LEDs) are currently limited for mass production by either process constraints and operating lifetime instability. Combining such technologies with compatible coating technologies would enable these materials to be used in LED products and to extend their operating range. FLINGO aims to develop novel processes and materials for conformal deposition meeting extreme requirements in e.g. 3D LEDs & thus being compatible with mass production.

Project Details

Call

Call 2015


Call Topic

New Surfaces and Coatings


Project start

02.01.2017


Project end

30.11.2020


Total project costs

1.417.478 €


Total project funding

749.483 €


TRL

-


Coordinator

Dr. Martin Strassburg

OSRAM Opto Semiconductors GmbH , Leibnizstr. 4, 93055 Regensburg, Germany


Partners and Funders Details

Consortium Partner   Country Funder
OSRAM Opto Semiconductors GmbH
https://www.osram-os.com
Large industry Germany DE-VDI-TZ
Fraunhofer Institut für Silicatforschung
https://www.isc.fraunhofer.de/inside-and-on-top-material-solutions-by-isc/
Research org. Germany DE-VDI-TZ
Uninova/CEMOP/CENIMAT
https://www.cenimat.fct.unl.pt
University Portugal PT-FCT
Picosun Oy
https://www.picosun.com
SME Finland FI-Tekes
Vilnius University (Institute of Applied Research)
http://www.tmi.vu.lt/en/
University Lithuania LT-RCL

Keywords

surface/interface properties, light emitting diodes, pyrolysis, sol-gel process, multilayer, Atomic layer Deposition, TCO