Cost-effective Atomic Layer Deposition Processes for Large Area Coating Applications – ERA-NET - CALDERA

Project summary

ALD has proven a key enabling technology for the continuous downscaling of microelectronics. Recently, novel reactor designs have enabled the application of ALD technology outside cleanrooms, targeting large area applications in photovoltaics, flexible electronics and powder coating. However, due to the large surface area involved in these applications, precursor cost is becoming a major bottleneck for industrial upscaling of ALD in these emerging application domains. Moreover, high volume usage of the currently used ALD precursors leads to severe safety risks. Within this project, we will address these challenges by developing and validating safe, cost-effective ALD processes. Reducing the cost of ALD processes will remove the obstacles for implementation of large area ALD at the industrial level, such that the whole value chain from equipment and material manufacturers up to the end-user applications will be able to enjoy the benefits of high quality nanocoatings deposited by ALD.